Events 2017

May 29-May 31

Optics & Photonics Finland
Oulu, Finland
website

May 30-June 1

Sensor + Test
Nuremberg, Germany
website

June 14-June 16

Opto Taiwan
Taipei, Taiwan
website

June 26-June 29

Laser World of Photonics
Munich, Germany
website

June 27-June 29

Sensors Expo
San Jose, CA
website

August 8-August 10

SPIE Optics & Photonics
San Diego, CA
website

September 12-September 13

SPIE Photomask & EUV
Monterey, CA
website

September 19-September 20

Frontiers in Optics
Washington, DC
website

October 11-October 12

Photonex
Coventry, UK
website

October 2017

ILOPE
Beijing, China
website

November 27-December 1

MRS Fall Meeting
Boston, MA
website

December 2017

Semicon JapanĀ 
Tokyo, Japan
website








     < Back to News & Events page

Energetiq EUV Light Source Installed on CEA-Leti Research Tool

Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies

Woburn, MA – February 28, 2007 – Energetiq Technology, Inc., a developer and manufacturer of specialized short wavelength light products for use in advanced technology applications, has announced that the company’s EQ-10 Extreme Ultraviolet (EUV) Light Source is being used on a new experimental tool developed by CEA-Leti in studies to characterize photoresist outgassing during exposure in EUV lithography processes. The 10-Watt EUV source utilizes Energetiq’s patented Electrodeless Z-Pinch™ technology and is fast becoming the standard source used for EUV infrastructure development.

CEA-Leti, a laboratory of the Minatec® Pole of innovation in Grenoble, France operated by the Technology Research Directorate of the French Atomic Energy Commission (CEA), has been pioneering research on EUV lithography since 1999. “The collaboration with Energetiq has allowed us to set up an outgassing tool which is essential for resist qualification and optic contamination studies and strengthens our capacity to support our collaborative programs with resists and materials suppliers,” comments Dr. Serge Tedesco, Lithography Program Manager at CEA-Leti. “Moreover, this system is of prime importance in the development of new resist platforms foreseen for the 22nm hp node,” he added.

“We are delighted to install our first light source in Europe at the world-class CEA-Leti research center,” said Deborah Gustafson, Vice President of Sales and Service for Energetiq. “Our technology easily integrated into their existing system and the stable EUV power output has enabled them to quickly begin their research.” Using inert Xenon gas, the compact EQ-10 creates a small bright EUV emitting plasma which produces ample EUV power for photoresist outgassing studies.
EUV lithography is a leading candidate for next generation lithography because of its capability of printing features of 32nm and below, covering the needs of the semiconductor industry well into the next decade.

Energetiq’s EQ-10 light source employs a patented electrode-free technology that inductively couples the current into the discharge plasma, making it extremely stable and controllable. The plasma is confined away from source components, minimizing heat load and reducing debris.

About Energetiq Technology, Inc.

Energetiq, based in Woburn, Massachusetts, was founded in March 2004 with a mission to be the preeminent developer and manufacturer of short wavelength light sources for use in the analysis and fabrication of nano-scale structures and products. Members of the Energetiq team have been responsible for developing many high power plasma sources that run daily in semiconductor fabrication facilities around the world. Energetiq’s goal is to leverage this expertise to develop novel, cost-effective, short wavelength light sources that enable the production of next generation devices. The company’s products cover the Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from 400nm to 1nm (nanometer) and can be used in lithography, metrology, inspection, resist and thin-film processing and R&D applications. For more information, visit www.energetiq.com

About CEA-Leti

The CEA, a public organization for technological research, carries out its missions in the domains of energy, information and health technologies and defense, building on the foundations of fundamental research at the highest level. Strengthened by the competence of its 15,000 researchers and collaborators, it is recognized internationally and constitutes a strong source of original ideas for public authorities, institutions and industries in France and in Europe. Located in Grenoble, CEA-Leti is at the leading edge of European research in microelectronics, microtechnology and nanotechnology. It employs nearly 1000 people and deposits around 200 patents per year. With 28 start-ups created or in the course of creation, it is one of the most important partners of the industrial world. For further information: www.cea.fr


     < Back to News & Events page