Events 2017

August 8-August 10

SPIE Optics & Photonics
San Diego, CA
website

September 12-September 13

SPIE Photomask & EUV
Monterey, CA
website

September 19-September 20

Frontiers in Optics
Washington, DC
website

October 11-October 12

Photonex
Coventry, UK
website

October 2017

ILOPE
Beijing, China
website

November 27-December 1

MRS Fall Meeting
Boston, MA
website

December 2017

Semicon JapanĀ 
Tokyo, Japan
website








     < Back to News & Events page

Energetiq Technology Introduces High Power,
High Brightness 20-Watt EUV Light Source

Product release program completed for advanced light source used in actinic inspection of EUV masks

Woburn, MA – September 24, 2012 – Energetiq Technology, Inc., a developer and manufacturer of specialized ultrahigh-brightness light sources for advanced technology applications, today announced it has successfully completed its product release program for the EQ-10HP 20-Watt EUV Light Source. Energetiq’s sixth unit for actinic inspection applications of EUV masks is scheduled to ship in the fourth quarter 2012. Energetiq Technology has established a leadership role in providing reliable, stable, cost- effective EUV sources with its EQ-10 Series – the workhorse EUV source for the EUV measurement and testing community. With its latest innovation, the EQ-10HP, Energetiq has been able to build upon that status by providing high 20-Watt power sources to EUV customers developing actinic mask inspection products.

The EQ-10HP high power sources have been running reliably in EUV mask inspection environments for more than a year. By the end of 2012, six EQ-10HP units are expected to have been successfully delivered and installed at customer sites throughout the world. “We are very pleased that our highly reliable EQ- 10 platform has been extended to this high power version to meet the needs of our customers in the U.S., Asia, and Europe,” says Debbie Gustafson, Vice President of Sales and Marketing for Energetiq. “As we complete our product introduction program for the EQ-10HP, we are ready to support increased demand as EUV lithography enters the manufacturing phase.”

The Energetiq EQ-10HP EUV Source operates at substantially higher input powers than its EQ-10 Series predecessors and delivers 20 Watts of in-band EUV into 2pi steradians. Its small, stable, inductively- driven plasma makes it ideal for use in EUV metrology and inspection applications. The modular design of the EQ-10HP enables easy integration into a process tool. The system includes Energetiq’s patented Electrodeless Z-pinch™ source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics.

For more information on the EQ-10HP and other Energetiq EUV sources, visit click here

About Energetiq Technology, Inc.

Energetiq Technology is the world’s leading developer and manufacturer of ultra-bright broadband light sources for a wide variety of advanced applications in life and materials sciences, semiconductor manufacturing, and R&D. Energetiq's light sources are based on a revolutionary laser-driven light source technology that generates high brightness across the spectrum, with high reliability and long operating life in a compact package. More information about Energetiq is available at www.energetiq.com.


     < Back to News & Events page