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Optics & Photonics Finland
Oulu, Finland
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May 30-June 1

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June 14-June 16

Opto Taiwan
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June 26-June 29

Laser World of Photonics
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August 8-August 10

SPIE Optics & Photonics
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September 12-September 13

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September 19-September 20

Frontiers in Optics
Washington, DC
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October 11-October 12

Photonex
Coventry, UK
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October 2017

ILOPE
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November 27-December 1

MRS Fall Meeting
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December 2017

Semicon JapanĀ 
Tokyo, Japan
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Energetiq Technology Receives Award at International EUVL Workshop

Company Recognized for Outstanding Contribution
to Advancement of EUV Lithography Infrastructure

Woburn, MA – July , 2009 – Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography for excellent performance of the Energetiq EUV light source and the company’s contribution to EUVL development – one of only two awards presented at the Workshop held last week in Honolulu, Hawaii.

Dr. Gregory Denbeaux, Assistant Professor of Nanoengineering at the College of Nanoscale Science and Engineering (“CNSE”) of the University at Albany and a recognized EUV expert, presented the award to Deborah Gustafson, VP of Marketing and Sales at Energetiq.

“Energetiq has made it possible for researchers to have reliable EUV photons to make EUV lithography become a reality,” said Professor Denbeaux. “Much of today’s research, including cutting-edge work being done at CNSE’s Albany NanoTech Complex, is conducted with the Energetiq EUV light source.”

Gustafson added, “Energetiq is pleased to receive this award and we are happy that we can contribute to the infrastructure development being done today. Moreover, we would like to thank all of our customers for their successful work in this field. Energetiq plans to continue its contribution to the successful implementation of EUV Lithography by working with the mask metrology suppliers to ensure that there is a reliable EUV source for metrology tools.”

Energetiq’s EQ-10 Series EUV Light Source features the company’s proprietary Electrodeless Z-PinchTM technology and produces stable EUV light, with low cost of ownership. The electrodeless source design is proven to run continuously and have highly repeatable performance. The EQ-10 Series is installed at major EUV technology centers in the USA, Europe and Asia, and is used in advanced photoresist testing and qualification, EUV optics testing, EUV microscopy, and most recently with the introduction of a high repetition rate (10 kHz) version, in metrology and research applications where simulation of HVM (High Volume Manufacturing) is required.

About Energetiq Technology, Inc.

Energetiq Technology is the world’s leading developer and manufacturer of ultra-bright broadband light sources for a wide variety of advanced applications in life and materials sciences, semiconductor manufacturing, and R&D. Energetiq's light sources are based on a revolutionary laser-driven light source technology that generates high brightness across the spectrum, with high reliability and long operating life in a compact package. More information about Energetiq is available at www.energetiq.com.


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