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Next-generation extreme ultraviolet (EUV) light source from Energetiq

As the miniaturization of semiconductor devices progresses, EUV exposure is becoming more and more practical. In order to promote further mass production, Energetiq has improved the brightness and power of its next-gen EUV source to increase throughput while maintaining the same compact and intuitive platform.

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Features

  • Brightness: 2 times or more*
  • Power: 2 times or more* 
  • High plasma spatial stability
  • Low total cost of ownership
  • Compact footprint
  • High reliability proven in mass production factories
  • Emission wavelength: 10 nm to 50 nm

        * Compared to current generation

Mask Inspection

Mask Inspection

Microexposure

Pellicle Inspection

Optical Component Inspection

Optical Component Inspection

Pellicle Inspection

Resist Material Research

Micro-Exposure Example

Resist Material Research

Photo Source: Lawrence Berkeley National Laboratory

Development Roadmap

 

Roadmap_updated4

 

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