EQX-850 LDLS®

Cutting-edge technology with user-focused design

IMG_9042-3

Innovation Meets Illumination

A next-generation product, the EQX-850 LDLS builds on the success of previous models offering enhanced performance, user experience, and value.


The EQX-850 enables higher resolution metrology to meet the stringent demands of the leading-edge semiconductor processes with faster, more precise measurements, thanks to unmatched stability and brightness.

  • Tool-To-Tool Matching: Ensures consistency across different tools and processes. Delivers uniform performance across all units.
  • Stability & Brightness: Provides unrivaled short-term stability with higher spectral radiance, especially in the deep UV range.
  • Improved Design: Features a modular crown for easy maintenance, eliminating the need for water cooling.
  • Smart Features & Controls: Includes event logging for setup and troubleshooting, enhanced remote software interface controls, and performance monitoring to maintain optimal measurements.

Features

Wavelength: 170 nm – 2500 nm
Plasma Size (FWHM)* 140 μm X 290 μm
Numerical Aperture: 0.58 NA
Bulb Lifetime: 10,000 hours
Laser Class: Class 1 (IEC 60825: 2014)

*Average, with Retroreflector

Output Configurations

Single and Dual Output Lampheads

 

Spectral Radiance Comparison 

Average radiance, measured with quartz output windows. For reference only.

EQX-850 LDLS Spectral Radiance Graph_High Res_2400 nm

 

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