EQX-850 LDLS®
Cutting-edge technology with user-focused design
Innovation Meets Illumination
A next-generation product, the EQX-850 LDLS builds on the success of previous models offering enhanced performance, user experience, and value.
The EQX-850 enables higher resolution metrology to meet the stringent demands of the leading-edge semiconductor processes with faster, more precise measurements, thanks to unmatched stability and brightness.
- Tool-To-Tool Matching: Ensures consistency across different tools and processes. Delivers uniform performance across all units.
- Stability & Brightness: Provides unrivaled short-term stability with higher spectral radiance, especially in the deep UV range.
- Improved Design: Features a modular crown for easy maintenance, eliminating the need for water cooling.
- Smart Features & Controls: Includes event logging for setup and troubleshooting, enhanced remote software interface controls, and performance monitoring to maintain optimal measurements.
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Features
Wavelength: 170 nm – 2500 nm
Plasma Size (FWHM)* 140 μm X 290 μm
Numerical Aperture: 0.58 NA
Bulb Lifetime: 10,000 hours
Laser Class: Class 1 (IEC 60825: 2014)
*Average, with Retroreflector
Output Configurations
Spectral Radiance Comparison
Average radiance, measured with quartz output windows. For reference only.