Modular Design for Easy Integration

Energetiq’s uniquely designed EUV light sources minimize heat load and reduce debris, giving you control over peak brightness and peak power in a compact, modular unit.

Advancements in fields such as semiconductor lithography, mask blank inspection, materials research and life sciences research rely on plasma-based light sources that generate radiation between the deep ultraviolet and x-ray regions (10 to 50 nm). Traditional method of producing extreme UV light uses electrodes, which generate heat and produce unwanted debris – not suitable for production environments.

Energetiq’s Electrodeless Z-Pinch™ EUV sources use a patented design that inductively couples the current into the plasma to generate ultrashort-wavelength UV radiation in a clean, cool way. The modular design delivers high up-time and field-proven reliability with the flexibility of user-controlled outputs for optimized power and brightness.

• Ease of use and reliability suitable for photoresist R&D
• Minimal heat load
• Excellent spatial stability
• High repetition rate
• Stable, repeatable power output
• Simple, flexible optical interface
• CE Mark and SEMI S2-0715 compliant