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-->Energetiq’s Laser-Driven Light Source Technology Enables Continuous Spectrum Light Sources, from Visible to Deep Ultraviolet
Woburn, MA – June 17, 2008 – Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has..
Energetiq EUV Light Source Installed on CEA-Leti Research Tool
Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies
EUV Technology Integrates Energetiq EUV Source into New Tool for EUV Resist Outgassing and Reflectivity Measurements
Martinez, CA – February 26, 2007 – EUV Technology, has developed a tool for screening candidate EUV resist formulations for possible use in other EUV tools. The tool is integrated..
Energetiq Receives Prestigious R&D 100 Award for its EQ-10 EUV Light Source
Woburn, MA – July 19, 2006 – Energetiq Technology, Inc. a developer and manufacturer of advanced short wavelength light products, is pleased to announce that R&D Magazine has..
Albany NanoTech Enhances State-of-the Art Lithography Research with New EUV Source from Energetiq
Albany, NY – July 5, 2005 – Albany NanoTech, a leading global center for nanotechnology research, development and deployment, today announced the delivery of a new state of the..