Energetiq Technology Unveils EQS-10: The Next-Generation Electrodeless Z-Pinch™ EUV Light Source for Semiconductor Metrology

Energetiq Technology, a subsidiary of Hamamatsu Photonics and a leader in high-performance light sources for advanced semiconductor and scientific applications, proudly announces the launch of the EQS-10 Electrodeless Z-Pinch™ EUV Light Source. The EQS-10 represents a significant leap forward in extreme ultraviolet (EUV) light generation, doubling performance while drastically reducing ownership costs.

The EQS-10 builds on a field-proven platform and delivers up to four times the energy per pulse with an impressive operating frequency of up to 5 kHz. Designed with solid-state switching technology, the EQS-10 ensures unmatched efficiency, making it the go-to solution for demanding EUV applications, including EUV metrology, resist development and defect inspection.

The EQS-10 integrates Energetiq’s unique direct fueling system, which can reduce gas consumption by up to 60%, delivering an efficient, cost-effective solution for the semiconductor industry. This translates to a 25% reduction in cost per watt, enabling organizations to achieve greater performance at lower operating costs.

Features of the EQS-10 EUV Light Source:

• Unmatched energy output: Up to 4X energy per pulse compared to the previous model.
• High-frequency operation: Operating frequencies up to 5 kHz, ensuring maximum performance for advanced applications.
• Lower cost of ownership: Up to 60% reduction in gas usage and 25% reduction in cost per watt.
• Pre-ionization control: Enhances z-pinch efficiency and enables tunability for various gases.
• Proven reliability: 60 EUV light sources currently installed, backed by Energetiq’s comprehensive support network.

EUV General Manager Don McDaniel, PhD., states: “The EQS-10 is a testament to our commitment to innovation and meeting the evolving needs of the semiconductor industry. With its unprecedented performance and cost-efficiency, we’re proud to offer a solution that not only boosts throughput but also reduces operating costs. The EQS-10 is an important advancement for EUV metrology, resist development, and defect inspection, and we’re thrilled to bring this cutting-edge technology to our customers worldwide.”

Energetiq’s patented Electrodeless Z-Pinch™ technology continues to set the standard for EUV and soft x-ray light sources. The EQS-10 maintains the low debris, long bore lifetime, and high spatial stability that customers expect, ensuring minimal downtime and maximizing operational efficiency. Supported by Hamamatsu Photonics’ global network, the EQS-10 is a reliable solution that adapts to the needs of the industry.

Energetiq will debut the EQS-10 at the SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference, taking place from September 29 to October 3, 2024, in Monterey, California.