News
Read about our latest announcements, product launch information and event schedule.
Energetiq Technology Receives Semiconductor International Editors Choice Best Product Award
Company recognized for manufacturing excellence in EUV Light Source Technology
Energetiq’s Laser-Driven Light Source Technology Enables Continuous Spectrum Light Sources, from Visible to Deep Ultraviolet
Woburn, MA – June 17, 2008 – Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has..
Energetiq EUV Light Source Installed on CEA-Leti Research Tool
Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies
EUV Technology Integrates Energetiq EUV Source into New Tool for EUV Resist Outgassing and Reflectivity Measurements
Martinez, CA – February 26, 2007 – EUV Technology, has developed a tool for screening candidate EUV resist formulations for possible use in other EUV tools. The tool is integrated..
Energetiq Receives Prestigious R&D 100 Award for its EQ-10 EUV Light Source
Woburn, MA – July 19, 2006 – Energetiq Technology, Inc. a developer and manufacturer of advanced short wavelength light products, is pleased to announce that R&D Magazine has..
Albany NanoTech Enhances State-of-the Art Lithography Research with New EUV Source from Energetiq
Albany, NY – July 5, 2005 – Albany NanoTech, a leading global center for nanotechnology research, development and deployment, today announced the delivery of a new state of the..